Extending spatial-phase-locked electron-beam lithography to two dimensions

被引：3

作者：

Goodberlet, JG ^{[1
]}

Ferrera, J ^{[1
]}

Farhoud, M ^{[1
]}

Chan, VZ ^{[1
]}

Smith, HI ^{[1
]}

机构：

[1] MIT, Elect Res Lab, Cambridge, MA 02139 USA

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1997年 / 36卷 / 12B期

关键词：

electron-beam lithography;

D O I：

10.1143/JJAP.36.7557

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The global-fiducial grid mode of spatial-phase-locked electron-beam lithography in two dimensions is investigated. A phase-locking scheme for two-dimensions is proposed and analyzed. An expression for the minimum locking dose is derived. The use of a scintillating grid is proposed, and results from optical detection of a scintillating fiducial grating are reported.

引用

页码：7557 / 7559

页数：3

共 9 条

[1]

BELIKOV SV, 1993, INSTRUM EXP TECH+, V36, P386

[2] Analogue delay-locked loop for spatial-phase locking [J].

Goodberlet, J ;

Ferrera, J ;

Smith, HI .

ELECTRONICS LETTERS, 1997, 33 (15) :1269-1270

[3]

GOODBERLET J, 1997, IN PRESS J VAC SCI B

[4]

GOODBERLET J, 1997, P INT C MICR NAN, P473

[5] A 155-MHZ CLOCK RECOVERY DELAY-LOCKED AND PHASE-LOCKED LOOP [J].

LEE, TH ;

BULZACCHELLI, JF .

IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1992, 27 (12) :1736-1746

[6] Large-area achromatic interferometric lithography for 100 nm period gratings and grids [J].

Savas, TA ;

Schattenburg, ML ;

Carter, JM ;

Smith, HI .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (06) :4167-4170

[7] Semiconductor on glass photocathodes as high-performance sources for parallel electron beam lithography [J].

Schneider, JE ;

Baum, AW ;

Winograd, GI ;

Pease, RFW ;

McCord, M ;

Spicer, WE ;

Costello, KA ;

Aebi, VW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (06) :3782-3786

[8] A NEW APPROACH TO HIGH FIDELITY E-BEAM AND ION-BEAM LITHOGRAPHY BASED ON AN INSITU GLOBAL-FIDUCIAL GRID [J].

SMITH, HI ;

HECTOR, SD ;

SCHATTENBURG, ML ;

ANDERSON, EH .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (06) :2992-2995

[9] CHARACTERIZATION OF NEAR-FIELD HOLOGRAPHY GRATING MASKS FOR OPTOELECTRONICS FABRICATED BY ELECTRON-BEAM LITHOGRAPHY [J].

TENNANT, DM ;

KOCH, TL ;

MULGREW, PP ;

GNALL, RP ;

OSTERMEYER, F ;

VERDIELL, JM .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (06) :2530-2535

← 1 →