Generation of nano-sized free standing single crystal silicon particles

被引：16

作者：

Dong, Y

Bapat, A

Hilchie, S

Kortshagen, U

Campbell, SA

机构：

[1] Univ Minnesota, Dept Elect & Comp Engn, Minneapolis, MN 55455 USA

[2] Univ Minnesota, Dept Mech Engn, Minneapolis, MN 55455 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2004年 / 22卷 / 04期

关键词：

D O I：

10.1116/1.1771667

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A system has been designed to generate monodisperse, single crystal silicon nanoparticles. The particles are generated using a SiH4/H-2 mixture in a high density plasma. An aerodynamic lens assembly focuses and size selects the particles. A high voltage plate is used to accelerate the charged particles such that they can be injected into a high temperature annealing tube to be heated. The shape and structure of the particles are changed in the annealing tube. Single crystals are obtained. (C) 2004 American Vacuum Society.

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页码：1923 / 1930

页数：8

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