An experimental setup to test the MAPPER electron lithography concept

被引：5

作者：

Kampherbeek, BJ

Wieland, MJ

van Zuuk, A

Kruit, P

机构：

[1] Delft Univ Technol, Dept Appl Phys, NL-2628 CJ Delft, Netherlands

[2] Delft Univ Technol, DIMES, NL-2628 CJ Delft, Netherlands

来源：

MICROELECTRONIC ENGINEERING | 2000年 / 53卷 / 1-4期

关键词：

Computer simulation - Electron optics - Image enhancement - Masks - Optical design - Optical systems - Photocathodes - Scanning electron microscopy;

D O I：

10.1016/S0167-9317(00)00314-2

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

An experimental setup to test the Multiple Pixel by Pixel. Enhancement of Resolution, or MAPPER, lithography concept is presented. Descriptions of both the light optical as the electron optical setup are discussed. Also the scanning mechanism and the alignment tools are pointed out. A cross section of the design of the setup is shown.

引用

页码：279 / 282

页数：4

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[3]

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