Experimental analysis of a DC-RF hybrid plasma flow

被引：29

作者：

Kawajiri, K ^{[1
]}

Sato, T ^{[1
]}

Nishiyama, H ^{[1
]}

机构：

[1] Tohoku Univ, Inst Fluid Sci, Aoba Ku, Sendai, Miyagi 9808577, Japan

来源：

SURFACE & COATINGS TECHNOLOGY | 2003年 / 171卷 / 1-3期

基金：

日本学术振兴会;

关键词：

DC-RF hybrid plasma flow; flow control; optimized operating condition;

D O I：

10.1016/S0257-8972(03)00256-1

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A direct current (DC)-RF hybrid plasma flow has a very complex flow structure because of the interaction between a DC plasma jet and a RF-ICP flow. Therefore, flow control of a DC-RF hybrid plasma flow is very important to enhance its characteristics such as temperature, stability and plasma flame length. In this paper, we clarified the linear interaction between the flow condition and plasma characteristics, and then optimized its operating condition. A DC-RF hybrid plasma flow becomes stable and is elongated with decreasing the central gas ratio. It also becomes stable with increasing the swirl gas. Moreover, a large amount of N-2 gas can be injected with the central gas. (C) 2003 Elsevier Science B.V. All rights reserved.

引用

页码：134 / 139

页数：6

共 21 条

[1] OBSERVATION OF DUST PARTICLE GROWTH AND FALLOUT IN RF-EXCITED SILANE DISCHARGES [J].

BOHME, W ;

KOHLER, WE ;

ROMHELD, M ;

VEPREK, S ;

SEEBOCK, RJ .

IEEE TRANSACTIONS ON PLASMA SCIENCE, 1994, 22 (02) :110-115

[2] Visualization and Diagnostics of Thermal Plasma Flows [J].

Boulos, M. I. .

JOURNAL OF VISUALIZATION, 2001, 4 (01) :19-28

[3] FLOW AND TEMPERATURE FIELDS IN FIRE-BALL OF AN INDUCTIVELY COUPLED PLASMA [J].

BOULOS, MI .

IEEE TRANSACTIONS ON PLASMA SCIENCE, 1976, 4 (01) :28-39

[4] Evaporation of copper powders in an inductively coupled thermal rf plasma-numerical modelling and spectroscopic measurements [J].

Buchner, P ;

Ferfers, H ;

Schubert, H ;

Uhlenbusch, J .

PLASMA SOURCES SCIENCE & TECHNOLOGY, 1997, 6 (03) :450-459

[5] Deformation and solidification process of a super-cooled droplet impacting on the substrate under plasma spraying conditions [J].

Chae, Y. K. ;

Mostaghimi, J. ;

Yoshida, T. .

SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS, 2000, 1 (03) :147-156

[6]

GROSS B, 1968, PLASMA TECHNOLOGY

[7]

HAN P, 2001, P 15 INT S PLASM CHE, V2, P683

[8]

HERNDON JW, 1991, SYNLETT, P1

[9] Highly c-axis oriented LiNb0.5Ta0.5O3 thin films on Si substrates fabricated by thermal plasma spray CVD [J].

Kulinich, SA ;

Shibata, J ;

Yamamoto, H ;

Shimada, Y ;

Terashima, K ;

Yoshida, T .

APPLIED SURFACE SCIENCE, 2001, 182 (1-2) :150-158

[10] LASER DOPPLER ANEMOMETRY UNDER PLASMA CONDITIONS .2. MEASUREMENTS IN AN INDUCTIVELY COUPLED RF PLASMA [J].

LESINSKI, J ;

BOULOS, MI .

PLASMA CHEMISTRY AND PLASMA PROCESSING, 1988, 8 (02) :133-144

← 1 2 3 →