Properties of multilayer and alloyed PVD films on the base of TiN

被引:9
作者
Andrievski, RA
机构
[1] Institute for New Chemical Problems, Russian Academy of Sciences, Chernogolovka
关键词
D O I
10.1016/0263-4368(96)83423-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The multilayer and alloyed films of TiN, ZrN, NbN and CrN produced by are deposition were investigated with use of X-ray diffraction, electron microscopy and microhardness measurements. A general tendency of the microhardness to increase with decreasing layer thickness was found in TiN-NbN(ZrN) systems. The microhardness maximum value (similar to 8000 HV 0.1) was formed in TiN-NbN multilayer films. The influence of spinodal decomposition, recrystallization, and heterodiffusion on the films' microhardness is also demonstrated.
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页码:105 / 107
页数:3
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