Self-assembled growth of InAs-quantum dots and postgrowth behavior studied by reflectance-difference spectroscopy

被引:8
作者
Kita, T [1 ]
Tachikawa, K [1 ]
Tango, H [1 ]
Yamashita, K [1 ]
Nishino, T [1 ]
机构
[1] Kobe Univ, Fac Engn, Dept Elect & Elect Engn, Kobe, Hyogo 6578501, Japan
关键词
RDS; wetting layer; S-K growth; quantum dots;
D O I
10.1016/S0169-4332(00)00132-X
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Initial stages of self-assembled growth of InAs dots on GaAs(001) and a postgrowth evolution of the deposited surface have been investigated by reflectance-difference (RD) spectroscopy and reflection high-energy electron diffraction (RHEED). A significant change in the RD spectrum occurs even at 0.1-monolayer (ML) deposition of InAs. With increasing InAs deposition, the As-dimer-elated RD sign is inverted, which indicates that the original As dimer along the [110] direction of the c(4 x 4) As-rich GaAs(001) surface becomes dimerized along the [-110] direction. Postgrowth behavior has been studied at 480 degrees C after 1.9-ML deposition of InAs. During postgrowth, the As-dimer-related RD signal returns to signals observed at lower InAs deposition. This behavior gives evidence that the InAs coverage is reduced by postgrowth. Furthermore, positive offsets that increase in amplitude with photon energy appear in the RD spectra of the postgrown samples. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:503 / 507
页数:5
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