Surfactant activated dip-pen nanolithography

被引:45
作者
Jung, H [1 ]
Dalal, CK [1 ]
Kuntz, S [1 ]
Shah, R [1 ]
Collier, CP [1 ]
机构
[1] CALTECH, Div Chem & Chem Engn, Pasadena, CA 91125 USA
关键词
D O I
10.1021/nl048705c
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Direct nanoscale patterning of maleimide-linked biotin on mercaptosilane-functionalized glass substrates using dip-pen nanolithography (DPN) was facilitated by the addition of a small amount of the biocompatible nonionic surfactant Tween-20. A correlation was found between activated biotin transfer from the AFM tip with surfactant included in the ink and an increase in the wettability of the partially hydrophobic silanized substrate. Surfactant concentration represents a new control variable for DPN that complements relative humidity, tip-substrate contact force, scan speed, and temperature. Using surfactants systematically as ink additives may expand the possible ink-substrate combinations that can be used for patterning biotin and other biomolecules, including proteins.
引用
收藏
页码:2171 / 2177
页数:7
相关论文
共 38 条
[11]   A new tool for studying the in situ growth processes for self-assembled monolayers under ambient conditions [J].
Hong, SH ;
Zhu, J ;
Mirkin, CA .
LANGMUIR, 1999, 15 (23) :7897-7900
[12]  
Hyun J, 2002, NANO LETT, V2, P1203, DOI 10.1021/n10257364
[13]  
ISRAELACHVILI J, 1993, INTERMOLECULAR SURFA, V158, P188
[14]   Dip-Pen nanolithography on semiconductor surfaces [J].
Ivanisevic, A ;
Mirkin, CA .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2001, 123 (32) :7887-7889
[15]   Self-assembly of ink molecules in dip-pen nanolithography: A diffusion model [J].
Jang, JY ;
Hong, SH ;
Schatz, GC ;
Ratner, MA .
JOURNAL OF CHEMICAL PHYSICS, 2001, 115 (06) :2721-2729
[16]   Liquid meniscus condensation in dip-pen nanolithography [J].
Jang, JY ;
Schatz, GC ;
Ratner, MA .
JOURNAL OF CHEMICAL PHYSICS, 2002, 116 (09) :3875-3886
[17]   Dip-pen nanolithography of reactive alkoxysilanes on glass [J].
Jung, H ;
Kulkarni, R ;
Collier, CP .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2003, 125 (40) :12096-12097
[18]   THE EVOLUTION OF SILICON-WAFER CLEANING TECHNOLOGY [J].
KERN, W .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1990, 137 (06) :1887-1892
[19]   Effect of water on silanization of silica by trimethoxysilanes [J].
Krasnoslobodtsev, AV ;
Smirnov, SN .
LANGMUIR, 2002, 18 (08) :3181-3184
[20]   Protein nanostructures formed via direct-write dip-pen nanolithography [J].
Lee, KB ;
Lim, JH ;
Mirkin, CA .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2003, 125 (19) :5588-5589