Characterization of thin, transparent and conductive TiN films prepared by radio frequency sputtering

被引：12

作者：

Kawamura, M ^{[1
]}

Abe, Y ^{[1
]}

Sasaki, K ^{[1
]}

机构：

[1] Kitami Inst Technol, Dept Mat Sci, Kitami, Hokkaido 090, Japan

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1998年 / 16卷 / 01期

关键词：

D O I：

10.1116/1.580970

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

[No abstract available]

引用

页码：200 / 202

页数：3

共 14 条

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