Hall constant in quantum-sized semimetal Bi films: Electric field effect influence

被引:9
作者
Butenko, AV [1 ]
Shvarts, D
Sandomirsky, V
Schlesinger, Y
Rosenbaum, R
机构
[1] Bar Ilan Univ, Dept Phys, IL-52900 Ramat Gan, Israel
[2] Bar Ilan Univ, Jack & Pearl Resnick Inst Adv Technol, IL-52900 Ramat Gan, Israel
[3] Tel Aviv Univ, Raymond & Beverly Sackler Fac Exact Sci, Sch Phys & Astron, IL-69978 Tel Aviv, Israel
关键词
D O I
10.1063/1.1288166
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report on the influence of a gate voltage on the Hall constant [electric field effect Hall constant (EFE-HC)] in a quantum-sized Bi film. The dependence of EFE-HC on the applied electric field, film thickness, and temperature was measured. The electric field effect induces a change of several tens of percent in the Hall constant under an applied electric field of 10(8) V/m. The effect depends on the film thickness in an oscillatory manner similar to that observed in other quantum-size characteristics. We present an interpretation of the known temperature maximum of HC in quantum size Bi films in absence of EFE, by considering the temperature dependence of the electron and hole mobilities. (C) 2000 American Institute of Physics. [S0021-8979(00)02718-3].
引用
收藏
页码:2634 / 2640
页数:7
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