Sequence of steps in the pitting of aluminum by chloride ions

被引:396
作者
McCafferty, E [1 ]
机构
[1] USN, Res Lab, Washington, DC 20375 USA
关键词
D O I
10.1016/S0010-938X(02)00231-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Corrosion pit initiation in chloride solutions is given by an electrode kinetic model which takes into account adsorption of chloride ions on the oxide surface, penetration of chloride ions through the oxide film, and localized dissolution of aluminum at the metal/oxide interface in consecutive one-electron transfer reactions. A previous model has been extended here to consider that penetration of chloride ions can occur by oxide film dissolution as well as by migration through oxygen vacancies. Pit initiation occurs by chloride-assisted localized dissolution at the oxide/metal interface. The electrode kinetic model leads to a mathematical expression which shows that the critical pitting potential is a linear function of the logarithm of the chloride concentration (at constant pH), in agreement with experiment. The model also predicts that the critical pitting potential is independent of pH (at constant chloride concentration), also in agreement with experiment. Corrosion pit propagation leads to formation of blisters beneath the oxide film due to localized reactions which produce an acidic localized environment. The blisters subsequently rupture due to the formation of hydrogen gas in the occluded corrosion cell. Calculation of the local pH within a blister from the calculated hydrogen pressure within the blister gives pH values in the range 0.85 to 2.3. Published by Elsevier Science Ltd.
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收藏
页码:1421 / 1438
页数:18
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