Synthesis and characterization of the platinum cluster complex Pt4(PF3)8

被引:10
作者
Hammill, CL [1 ]
Clark, RJ [1 ]
Ross, CW [1 ]
Marshall, AG [1 ]
Schmutz, J [1 ]
机构
[1] Florida State Univ, Dept Chem, Tallahassee, FL 32306 USA
关键词
D O I
10.1021/ic970590a
中图分类号
O61 [无机化学];
学科分类号
070301 ; 081704 ;
摘要
At temperatures approaching 200 degrees C, Pt(PF3)(4) loses PF3 and yields a cluster, Pt-4(PF3)(8). This composition has been confirmed by Fourier transform ion cyclotron resonance mass spectrometry, but its structure is unknown. At higher temperature, the monomer yields platinum metal (confirmed by X-ray diffraction) and the expected quantity of PF3 gas. The PF3 Produced contains no observable impurities. Ligands such as olefins do not replace the PF3 in Pt(PF3)(4). However, ligands like P(OCH3)(3) cause extensive replacement of the PF3 ligand.
引用
收藏
页码:5973 / 5977
页数:5
相关论文
共 22 条
[11]   TAILORED EXCITATION FOR FOURIER-TRANSFORM ION-CYCLOTRON RESONANCE MASS-SPECTROMETRY [J].
MARSHALL, AG ;
WANG, TCL ;
RICCA, TL .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1985, 107 (26) :7893-7897
[12]  
Mingos D. M. P., 1990, INTRO CLUSTER CHEM
[13]   COMPOSITION PROFILES OF CVD PLATINUM AND PLATINUM SILICIDE BY AUGER-ELECTRON SPECTROSCOPY AND SECONDARY ION MASS-SPECTROMETRY [J].
MORABITO, JM ;
RAND, MJ .
THIN SOLID FILMS, 1974, 22 (03) :293-303
[14]  
MOSKOVITS M, 1986, METAL CLUSTERS
[15]  
Nixon J. F., 1975, PLATIN MET REV, V19, P22
[16]  
NIXON JF, 1985, ADV INORG CHEM RAD, V29, P42
[17]   CHEMICAL VAPOR-DEPOSITION OF THIN-FILM PLATINUM [J].
RAND, MJ .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (05) :686-693
[18]   CHEMISTRY OF TRANSITION-METAL VAPOURS .1. REACTIONS WITH TRIFLUOROPHOSPHINE AND RELATED COMPOUNDS [J].
TIMMS, PL .
JOURNAL OF THE CHEMICAL SOCIETY A -INORGANIC PHYSICAL THEORETICAL, 1970, (15) :2526-&
[19]   METAL CARBONYL-TRIFLUOROPHOSPHINE SYSTEMS .10. MONORUTHENIUM AND TRIRUTHENIUM CARBONYLS [J].
UDOVICH, CA ;
CLARK, RJ .
JOURNAL OF ORGANOMETALLIC CHEMISTRY, 1972, 36 (02) :355-&
[20]   ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION OF PLATINUM - REACTION-KINETICS AND VAPOR-PRESSURES OF PRECURSORS [J].
XUE, ZL ;
THRIDANDAM, H ;
KAESZ, HD ;
HICKS, RF .
CHEMISTRY OF MATERIALS, 1992, 4 (01) :162-166