Mass spectrometry and absorption spectroscopy for oxidation of titanium target in rf magnetron sputtering

被引：11

作者：

Okimura, K

Nakamura, T

Shibata, A

机构：

[1] Tokai Univ, Fac Engn, Dept Elect, Hiratsuka, Kanagawa 2591292, Japan

[2] Fukui Natl Coll Technol, Dept Elect Engn, Fukui 9168507, Japan

来源：

VACUUM | 2000年 / 59卷 / 2-3期

关键词：

D O I：

10.1016/S0042-207X(00)00322-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Mass spectrometry and absorption spectroscopy were performed for a study of surface oxidation of titanium (Ti) target in rf magnetron sputtering, Line-averaged Ti atom density was measured with a resolution of 5 x 10(8) cm(-3) by means of an atomic absorption method. Hysteresis characteristic between Ti atom density and oxygen pressure was obtained for Ar pressure of 20 mTorr with rf power of 200 W, In a mass spectrometry for substrate-incident ions, TiO+ and TiO2+,' were detected in He-O-2, discharge, Transient characteristics of substrate-incident ion currents were presented showing transient time scale from oxide to metallic mode. (C) 2000 Elsevier Science Ltd. All rights reserved.

引用

页码：600 / 605

页数：6

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