DIFFUSION OF SI ATOMS AND THIN-FILM DEPOSITION IN A SILANE ARGON PLASMA

被引：41

作者：

TACHIBANA, K

TADOKORO, H

HARIMA, H

URANO, Y

机构：

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1982年 / 15卷 / 01期

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D O I：

10.1088/0022-3727/15/1/019

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：177 / 184

页数：8

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