High resolution magnetic patterning using focused ion beam irradiation

被引：18

作者：

Vieu, C

Gierak, J

Launois, H

Aign, T

Meyer, P

Jamet, JP

Ferré, J

Chappert, C

Mathet, V

Bernas, H

机构：

[1] CNRS, F-92225 Bagneux, France

[2] Univ Paris 11, Phys Solides Lab, F-91405 Orsay, France

[3] Univ Paris 11, Inst Elect Fondamentale, F-91405 Orsay, France

[4] Univ Paris 11, Ctr Spectrometrie Nucl & Spectrometrie Masse, F-91405 Orsay, France

来源：

MICROELECTRONIC ENGINEERING | 2000年 / 53卷 / 1-4期

关键词：

Cobalt - Coercive force - Helium neon lasers - Irradiation - Magnetic properties - Magnetization - Nanotechnology - Paramagnetism - Photolithography - Plutonium - Sputtering - Temperature;

D O I：

10.1016/S0167-9317(00)00294-X

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We show how Focused Ion Beam irradiation can be used to modify the magnetic properties of a thin Co/Pt layer at a nanometric length-scale. The control of the injected ion dose enables the adjustment of the coercive field and the Curie temperature of the layer on localized parts of the sample. The mechanism induced during irradiation is identified as a collisional mixing process which incorporates some Pt into the Co layer thus lowering the Curie temperature. The ultimate resolution of this magnetic patterning technique is discussed.

引用

页码：191 / 194

页数：4

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