Measurement of the absolute CF2 concentration in a dielectric barrier discharge running in argon/fluorocarbon mixtures

被引：32

作者：

Vinogradov, IP ^{[1
]}

Dinkelmann, A ^{[1
]}

Lunk, A ^{[1
]}

机构：

[1] Univ Stuttgart, Inst Plasmaforsch, D-70569 Stuttgart, Germany

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 2004年 / 37卷 / 21期

关键词：

D O I：

10.1088/0022-3727/37/21/010

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The role of different CFx-radicals in plasma polymerization in fluorocarbon mixtures has not been determined yet. Therefore spectroscopic investigations of dielectric barrier discharges (DBDs) in argon/fluorocarbon mixtures at atmospheric pressure were conducted with the focus on measurement of the concentration of CFx-radicals. The following diagnostic procedures were applied: FTIR absorption spectroscopy to diagnose stable compounds in the discharge, optical emission spectroscopy of the DBD in the UV and visible range and measurement of the CF2 concentration by UV absorption spectroscopy. The DBD was running in argon with the following admixtures: CF4, C2F6, C2H2F4, C3F8, C3HF7, c-C4F8. The relative concentration of the CF3-radical and the absolute concentration of CF2 in Ar/fluorocarbon mixtures were measured by emission spectroscopy and by absorption and emission spectroscopy, respectively. Emission and absorption spectroscopy were performed simultaneously in combination with electrical measurements of the discharge characteristics. The influence of small amounts of hydrogen or oxygen added to the argon/fluorocarbon mixtures was investigated.

引用

页码：3000 / 3007

页数：8

共 15 条

[1] Absolute radical densities in etching plasmas determined by broad-band UV absorption spectroscopy [J].

Booth, JP ;

Cunge, G ;

Neuilly, F ;

Sadeghi, N .

PLASMA SOURCES SCIENCE & TECHNOLOGY, 1998, 7 (03) :423-430

[2] FOURIER-TRANSFORM SPECTROSCOPY OF THE V1 AND V3 FUNDAMENTAL BANDS OF CF2 [J].

BURKHOLDER, JB ;

HOWARD, CJ ;

HAMILTON, PA .

JOURNAL OF MOLECULAR SPECTROSCOPY, 1988, 127 (02) :362-369

[3] CF2 production and loss mechanisms in fluorocarbon discharges:: Fluorine-poor conditions and polymerization [J].

Cunge, G ;

Booth, JP .

JOURNAL OF APPLIED PHYSICS, 1999, 85 (08) :3952-3959

[4] MATRIX-ISOLATION STUDY OF THE INTERACTION OF EXCITED NEON ATOMS WITH CF4 - INFRARED-SPECTRA OF CF3(+) AND CF3(-) [J].

FORNEY, D ;

JACOX, ME ;

IRIKURA, KK .

JOURNAL OF CHEMICAL PHYSICS, 1994, 101 (10) :8290-8296

[5] Radical behavior in fluorocarbon plasma and control of silicon oxide etching by injection of radicals [J].

Goto, T ;

Hori, M .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1996, 35 (12B) :6521-6527

[6] Production and destruction of CFx radicals in radio-frequency fluorocarbon plasmas [J].

Haverlag, M ;

Stoffels, WW ;

Stoffels, E ;

Kroesen, GMW ;

deHoog, FJ .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1996, 14 (02) :384-390

[7] Dielectric-barrier discharges: Their history, discharge physics, and industrial applications [J].

Kogelschatz, U .

PLASMA CHEMISTRY AND PLASMA PROCESSING, 2003, 23 (01) :1-46

[8] Kinetics of radicals in CF4 and C4F8 electron cyclotron resonance plasmas [J].

Miyata, K ;

Hori, M ;

Goto, T .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (08) :5340-5345

[9] ROLE OF THE CHAMBER WALL IN LOW-PRESSURE HIGH-DENSITY ETCHING PLASMAS [J].

ONEILL, JA ;

SINGH, J .

JOURNAL OF APPLIED PHYSICS, 1995, 77 (02) :497-504

[10] EMISSION-SPECTRA OF CF3 RADICALS .1. UV AND VISIBLE EMISSION-SPECTRA OF CF3 OBSERVED IN THE VUV PHOTOLYSIS AND THE METASTABLE ARGON ATOM REACTION OF CF3H [J].

SUTO, M ;

WASHIDA, N .

JOURNAL OF CHEMICAL PHYSICS, 1983, 78 (03) :1007-1011

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