Controlling crystallization of Pb(Zr,Ti)O3 thin films on IrO2 electrodes at low temperature through interface engineering

被引:38
作者
Maki, K [1 ]
Liu, BT
Vu, H
Nagarajan, V
Ramesh, R
Fujimori, Y
Nakamura, T
Takasu, H
机构
[1] Univ Maryland, Dept Mat & Nucl Engn, College Pk, MD 20742 USA
[2] Univ Maryland, Ctr Supercond Res, College Pk, MD 20742 USA
[3] ROHM Co Ltd, Ukyo Ku, Kyoto 6158585, Japan
关键词
D O I
10.1063/1.1544057
中图分类号
O59 [应用物理学];
学科分类号
摘要
Pb(Zr,Ti)O-3 (PZT) capacitors were fabricated on IrO2-Si substrates with and without SrRuO3 (SRO) template layers using a modified sol-gel process. The crystallization temperature of PZT films was lowered significantly by interposing a thin SRO layer between the PZT and IrO2, which modifies the nucleation and growth of perovskite PZT by acting as a structural and chemical template. At 450 degreesC, the films deposited directly on IrO2 were not perovskite phase and therefore not ferroelectric; at 550 degreesC, they exhibited a mixed perovskite-pyrochlore microstructure. In contrast, the introduction of a thin (10-50 nm) SRO template layer yielded complete perovskite phase at temperatures down to 450 degreesC. Test capacitors exhibited desirable ferroelectric properties, including low saturation voltage, high resistivity, small pulse-width dependence, and good fatigue endurance, which provides a promising way to low-temperature integration of high-density ferroelectric random access memories with a stacked-type capacitor structure. (C) 2003 American Institute of Physics.
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页码:1263 / 1265
页数:3
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