CPP-GMR films with a current-confined-path nano-oxide layer (CCP-NOL)

被引:26
作者
Fukuzawa, Hideaki [1 ]
Yuasa, Hiromi [1 ]
Iwasaki, Hitoshi [1 ]
机构
[1] Toshiba Co Ltd, Corp R&D Ctr, Saiwai Ku, Kawasaki, Kanagawa 2128582, Japan
关键词
D O I
10.1088/0022-3727/40/5/S01
中图分类号
O59 [应用物理学];
学科分类号
摘要
We investigated the film performance and nanostructure of current-perpendicular-to-plane giant magnetoresistance ( CPP-GMR) spin-valve film with a current-confined-path nano-oxide layer ( CCP-NOL). By applying ion-assisted oxidation ( IAO) for the CCP-NOL formation, we enhanced the MR ratio to 5.4% at a small RA value of 500m Omega mu m(2) for conventional Co90Fe10 layers. Furthermore, the use of bcc-Fe50Co50 also increased the MR ratio to 8.2% at a small RA value of 580m Omega mu m(2). A modified Valet-Fert model for the CCP-NOL showed that the MR enhancement by the IAO is due to the improvement in resistivity of the CCP, and that by Fe50Co50 is due to a larger spin-dependent interface scattering effect. Analysis by cross-sectional TEM and three-dimensional atom probe confirmed the formation of the CCP-NOL structure. A reliability test for test element devices showed almost no change even under acceleration stress. The CPP-GMR spin-valve film with the CCP-NOL is extendable to future high-density recording heads due to its potential for a higher MR ratio at a small value of RA.
引用
收藏
页码:1213 / 1220
页数:8
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