High-quality sample preparation by low kV FIB thinning for analytical TEM measurements

被引:82
作者
Bals, Sara
Tirry, Wim
Geurts, Remco
Yang, Zhiqing
Schryvers, Dominique
机构
[1] Univ Antwerp, CGB, Electron Microscopy Mat Sci, B-2020 Antwerp, Belgium
[2] FEI Co, NL-5651 GG Eindhoven, Netherlands
关键词
low kV thinning; FIB; NiTi; multilayer oxides; TEM; sample preparation;
D O I
10.1017/S1431927607070018
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Focused ion beam specimen preparation has been used for NiTi samples and SrTiO(3)/SrRuO(3) multilayers with prevention of surface amorphization and Ga implantation by a 2-kV cleaning procedure. Transmission electron microscopy techniques show that the samples are of high quality with a controlled thickness over large scales. Furthermore, preferential thinning effects in multicompounds are avoided, which is important when analytical transmission electron microscopy measurements need to be interpreted in a quantitative manner. The results are compared to similar measurements acquired for samples obtained using conventional preparation techniques such as electropolishing for alloys and ion milling for oxides.
引用
收藏
页码:80 / 86
页数:7
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