ION-IMPLANTATION DAMAGE AND ANNEALING IN GERMANIUM

被引：117

作者：

HOLLAND, OW

APPLETON, BR

NARAYAN, J

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1983年 / 54卷 / 05期

关键词：

D O I：

10.1063/1.332385

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2295 / 2301

页数：7

共 27 条

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[7]

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