Temperature dependence of GaAs1-xBix band gap studied by photoreflectance spectroscopy

被引:162
作者
Yoshida, J
Kita, T
Wada, O
Oe, K
机构
[1] Kobe Univ, Fac Engn, Dept Elect & Elect Engn, Kobe, Hyogo 6578501, Japan
[2] Kyoto Inst Technol, Dept Elect & Informat Sci, Sakyo Ku, Kyoto 6068585, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2003年 / 42卷 / 2A期
关键词
temperature-insensitive band gap; GaAsBi; MOVPE;
D O I
10.1143/JJAP.42.371
中图分类号
O59 [应用物理学];
学科分类号
摘要
We performed photoreflectance (PR) spectroscopy in order to investigate the fundamental band gap of GaAs1-xBix alloys. The temperature dependence of the band gap energy was evaluated by analyzing of the Franz-Keldysh oscillation in the PR spectra. With increasing Bi content, the band gap energy of GaAs1-xBix alloy is reduced, which shows a large optical bowing. The temperature coefficient of the band,gap decreases appreciably in alloys with increasing Bi content. For x = 0.026, the temperature coefficient near room temperature is -0.15 meV/K which is 1/3 of the value for GaAs.
引用
收藏
页码:371 / 374
页数:4
相关论文
共 14 条
[1]  
APSNES DE, 1973, PHYS REV B, V7, P4605
[2]  
Aspnes D. E., 1980, Handbook on semiconductors, vol.II. Optical properties of solids, P109
[3]   Very small temperature-dependent band-gap energy in TlInGaAs/InP double heterostructures grown by gas-source molecular-beam epitaxy [J].
Ayabe, A ;
Asahi, H ;
Lee, HJ ;
Maeda, O ;
Konishi, K ;
Asami, K ;
Gonda, S .
APPLIED PHYSICS LETTERS, 2000, 77 (14) :2148-2150
[4]   ELECTROREFLECTANCE AND PHOTOREFLECTANCE STUDY OF THE SPACE-CHARGE REGION IN SEMICONDUCTORS - (IN-SN-O)/INP AS A MODEL SYSTEM [J].
BHATTACHARYA, RN ;
SHEN, H ;
PARAYANTHAL, P ;
POLLAK, FH ;
COUTTS, T ;
AHARONI, H .
PHYSICAL REVIEW B, 1988, 37 (08) :4044-4050
[5]  
MADELUNG O, 1987, LNADOLTBORNSTEIN NUM, V22
[6]  
Oe K, 1996, IEICE T ELECTRON, VE79C, P1751
[7]  
Oe K, 2000, IEEE LEOS ANN MTG, P788, DOI 10.1109/LEOS.2000.894090
[8]   New semiconductor alloy GaAs1-xBix grown by metal organic vapor phase epitaxy [J].
Oe, K ;
Okamoto, H .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1998, 37 (11A) :L1283-L1285
[9]  
OE K, 1995, REC ELECT MAT S E, V5, P191
[10]   Growth of metastable alloy InAsBi by low-pressure MOVPE [J].
Okamoto, H ;
Oe, K .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1998, 37 (3B) :1608-1613