STUDY OF THE RAPID THERMAL NITRIDATION AND SILICIDATION OF TI USING ELASTIC RECOIL DETECTION .2. TI ON SIO2

被引:32
作者
KROOSHOF, GJP [1 ]
HABRAKEN, FHPM [1 ]
VANDERWEG, WF [1 ]
VANDENHOVE, L [1 ]
MAEX, K [1 ]
DEKEERSMAECKER, RF [1 ]
机构
[1] INTERUNIV MICROELECTR CTR,B-3030 LEUVEN,BELGIUM
关键词
D O I
10.1063/1.340411
中图分类号
O59 [应用物理学];
学科分类号
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页码:5110 / 5114
页数:5
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