TEMPERATURE-DEPENDENCE OF METAL-FILM GROWTH VIA LOW-ENERGY ELECTRON-DIFFRACTION INTENSITY OSCILLATIONS - PT/PD(100)

被引:39
作者
FLYNN, DK [1 ]
EVANS, JW [1 ]
THIEL, PA [1 ]
机构
[1] IOWA STATE UNIV SCI & TECHNOL,AMES LAB,AMES,IA 50011
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 03期
关键词
D O I
10.1116/1.575950
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:2162 / 2166
页数:5
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