EXPERIMENTAL-DETERMINATION OF ADSORBATE-INDUCED SURFACE STRESS - OXYGEN ON SI(111) AND SI(100)

被引：100

作者：

SANDER, D

IBACH, H

机构：

[1] Institut für Grenzflächenforschung und Vakuumphysik, Forschungszentrum Jülich, D-5170 Jülich

来源：

PHYSICAL REVIEW B | 1991年 / 43卷 / 05期

关键词：

D O I：

10.1103/PhysRevB.43.4263

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We have determined the surface stress induced by the room-temperature adsorption of oxygen on Si(111) and Si(100) surfaces. As a result of the breaking of the Si-Si bonds and the formation of the Si-O-Si bonds, both surfaces exhibit a measurable stress. Whereas the system O-Si(111) shows a compressive stress of -7200 dyn/cm, the adsorption of oxygen on a Si(100) surface leads to a tensile stress of +260 dyn/cm per monolayer oxygen coverage. The experimental results are in decent agreement with a simple cluster calculation using a valence-bond model.

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页码：4263 / 4267

页数：5

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