THE EFFECT OF HOLES ON THE INJECTION-INDUCED BREAKDOWN IN N-CHANNEL MOSFETS

被引:6
作者
KOTANI, N
KAWAZU, S
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D O I
10.1109/T-ED.1985.22008
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:722 / 724
页数:3
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共 21 条
[1]  
AKASAKA Y, 1983, DIG TECH S VLSI TECH, P48
[2]   DRAIN VOLTAGE LIMITATIONS OF MOS-TRANSISTORS [J].
BATEMAN, IM ;
ARMSTRONG, GA ;
MAGOWAN, JA .
SOLID-STATE ELECTRONICS, 1974, 17 (06) :539-550
[3]   SURFACE CONDUCTION IN SHORT-CHANNEL MOS DEVICES AS A LIMITATION TO VLSI SCALING [J].
EITAN, B ;
FROHMANBENTCHKOWSKY, D .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1982, 29 (02) :254-266
[4]  
HSU FC, 1983, IEEE T ELECTRON DEV, V30, P571
[5]  
HSU FC, 1982, IEEE T ELECTRON DEV, V29, P1735
[6]  
KENNEDY DP, 1973, IEDM, P160
[7]   COMPUTER-ANALYSIS OF PUNCH-THROUGH IN MOSFETS [J].
KOTANI, N ;
KAWAZU, S .
SOLID-STATE ELECTRONICS, 1979, 22 (01) :63-+
[8]   BEHAVIOR OF HOLES GENERATED BY IMPACT IONIZATION IN NORMAL-CHANNEL MOSFETS [J].
KOTANI, N ;
KAWAZU, S ;
KOMORI, S .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1983, 30 (12) :1678-1680
[9]   CHARACTERISTICS AND LIMITATION OF SCALED-DOWN MOSFETS DUE TO 2-DIMENSIONAL FIELD-EFFECT [J].
MASUDA, H ;
NAKAI, M ;
KUBO, M .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (06) :980-986
[10]   CHARACTERISTICS OF STATIC INDUCTION TRANSISTORS - EFFECTS OF SERIES RESISTANCE [J].
MOCHIDA, Y ;
NISHIZAWA, JI ;
OHMI, T ;
GUPTA, RK .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1978, 25 (07) :761-767