SILICIDES OF RUTHENIUM AND OSMIUM - THIN-FILM REACTIONS, DIFFUSION, NUCLEATION, AND STABILITY

被引：56

作者：

PETERSSON, CS ^{[1
]}

BAGLIN, JEE ^{[1
]}

DEMPSEY, JJ ^{[1
]}

DHEURLE, FM ^{[1
]}

LAPLACA, SJ ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

关键词：

D O I：

10.1063/1.331319

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4866 / 4883

页数：18

共 50 条

[11] SILICIDE FORMATION AND INTERDIFFUSION EFFECTS IN SI-TA, SIO2-TA AND SI-PTSI-TA THIN-FILM STRUCTURES
CHRISTOU, A
DAY, HM
[J]. JOURNAL OF ELECTRONIC MATERIALS, 1976, 5 (01) : 1 - 12
[12] CHU WK, 1974, APPL PHYS LETT, V25, P459
[13] COE C, 1974, C SER I PHYSICS, V22, P74
[14] CRIDER CA, 1980, THIN FILM INTERFACES, P135
[15] CRYSTAL STRUCTURE OF OSSI2
ENGSTROM, I
[J]. ACTA CHEMICA SCANDINAVICA, 1970, 24 (06): : 2117 - &
[16] ENGSTROM I, 1970, STRUCTURAL CHEM PLAT
[17] GAGE PR, 1965, T METALL SOC AIME, V233, P832
[18] GIRIFALCO LA, 1973, DIFFUSION, P185
[19] REACTION-KINETICS OF MOLYBDENUM THIN-FILMS ON SILICON(111) SURFACE
GUIVARCH, A
AUVRAY, P
BERTHOU, L
LECUN, M
BOULET, JP
HENOC, P
PELOUS, G
MARTINEZ, A
[J]. JOURNAL OF APPLIED PHYSICS, 1978, 49 (01) : 233 - 237
[20] SELF-DIFFUSION AND CORRELATION EFFECTS IN ORDERED AUZN ALLOYS
GUPTA, D
LIEBERMAN, DS
[J]. PHYSICAL REVIEW B-SOLID STATE, 1971, 4 (04): : 1070 - +