LOW-VOLTAGE MAGNETRON DISCHARGES FOR THIN-FILM PREPARATION

Magnetron discharges with low operating voltages |Uk| ≲ 100 V are of interest for sputtering sources with low particle energies and for plasma activation of the film deposition process. In this paper we examine the possibility of decreasing the operating voltage of different magnetron types by injection of thermionic electrons from tungsten filaments. As a special case the angular distribution of sputtered tantalum is measured in the range of Uk = -90 to -500 V. © 1990.