INFLUENCE OF DEPOSITION RATE ON PROPERTIES OF REACTIVELY SPUTTERED TIN-CHI FILMS

被引：7

作者：

MUSIL, J ^{[1
]}

POULEK, V ^{[1
]}

VYSKOCIL, J ^{[1
]}

KADLEC, S ^{[1
]}

VALVODA, V ^{[1
]}

KUZEL, R ^{[1
]}

CERNY, R ^{[1
]}

机构：

[1] CHARLES UNIV,FAC MATH & PHYS,DEPT SEMICOND PHYS,CS-12116 PRAGUE 2,CZECHOSLOVAKIA

来源：

关键词：

MAGNETRON SPUTTERING - MICROHARDNESS - PHASE COMPOSITION;

D O I：

10.1016/0042-207X(88)90588-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：459 / 461

页数：3

共 7 条

[1] THE MICROSTRUCTURE OF REACTIVELY SPUTTERED TI-N FILMS CONTAINING THE TI2N PHASE
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SUNDGREN, JE
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JACOBSON, BE
[J]. ACTA METALLURGICA, 1985, 33 (05): : 797 - 803
[2] THE MICROSTRUCTURE OF REACTIVELY SPUTTERED TI-N FILMS
HIBBS, MK
SUNDGREN, JE
JACOBSON, BE
JOHANSSON, BO
[J]. THIN SOLID FILMS, 1983, 107 (02) : 149 - 157
[3] JACOBSSON BE, 1982, THIN SOLID FILMS, V87, P181
[4] TI-N PHASES FORMED BY REACTIVE ION PLATING
MOLARIUS, JM
KORHONEN, AS
RISTOLAINEN, EO
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (06): : 2419 - 2425
[5] TINX COATINGS PREPARED BY DC REACTIVE MAGNETRON SPUTTERING
MUSIL, J
BARDOS, L
RAJSKY, A
VYSKOCIL, J
DOLEZAL, B
LONCAR, G
DADOUREK, K
KUBICEK, V
[J]. THIN SOLID FILMS, 1986, 136 (02) : 229 - 239
[6] Musil J., 1987, 6 INT C ION PLASM AS, P184
[7] STRUCTURE AND PROPERTIES OF TIN COATINGS
SUNDGREN, JE
[J]. THIN SOLID FILMS, 1985, 128 (1-2) : 21 - 44