DC DIODE SPUTTERING OF TITANIUM - DETERMINATION OF OPTIMAL DEPOSITION CONDITIONS BY ELECTRICAL AND SPECTROSCOPIC INVESTIGATIONS

被引:8
作者
POITEVIN, JM [1 ]
LEMPERIERE, G [1 ]
FOURRIER, C [1 ]
机构
[1] UNIV NANTES,INST PHYS,LAB PHYS CORPUSCULAIRE,F-44037 NANTES,FRANCE
关键词
D O I
10.1088/0022-3727/9/12/017
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:1783 / 1795
页数:13
相关论文
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[22]   ANALYSIS OF SPUTTERING DISCHARGE BY OPTICAL AND MASS-SPECTROMETRY .1. PLATINUM AND TANTALUM SPUTTERED IN ARGON [J].
WESTWOOD, WD ;
BOYNTON, RJ .
JOURNAL OF APPLIED PHYSICS, 1973, 44 (06) :2610-2618