RADIOLYSIS OF RESIST POLYMERS .4. POLY(PARA-SUBSTITUTED-ALPHA-METHYLSTYRENE)S

被引:7
作者
BABU, GN
LU, PH
HSU, SL
CHIEN, JCW
机构
[1] UNIV MASSACHUSETTS,MAT RES LABS,DEPT CHEM,AMHERST,MA 01003
[2] UNIV MASSACHUSETTS,MAT RES LABS,DEPT POLYMER SCI & ENGN,AMHERST,MA 01003
关键词
GAMMA RAYS - MONOMERS - Chemistry - PHOTORESISTS - POLYMERS - Decomposition - RADIATION EFFECTS;
D O I
10.1002/pol.1984.170220120
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
In the reported experiments, the effect of parasubstituents on the radiation chemistry of poly( alpha -methylstyrene) (PMS) was compared for the fluoro (PFMS), chloro (PCMS), bromo (PBMS), isopropyl(PiPMS), and methoxy (PMeOM) derivatives. Radiolysis yields, ESR spectra, and GC-MS analysis of products were obtained. PMS and PFMS have similar low radiolysis yields, products, and product distributions. Only main-chain radicals which persist to 200 degree were observed. PCMS has increased values of G//s, G//x, and G//r. The product analysis results suggest that the presence of chlorine contributes to the primary process by dissociative electron capture and enhances the cleavage of alpha -methyl group. Irradiation of PBMS caused crosslinking and yielded few volatile products. PMeOMS and PiPMS gel readily by gamma -irradiation and may be useful as negative radiation resists.
引用
收藏
页码:213 / 223
页数:11
相关论文
共 11 条
[1]   RADIOLYSIS OF RESIST POLYMERS .3. COPOLYMERS OF METHYL-ALPHA-CHLOROACRYLATE AND TRIHALOETHYLMETHACRYLATES [J].
BABU, GN ;
LU, PH ;
HSU, SL ;
CHIEN, JCW .
JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, 1984, 22 (01) :195-211
[2]  
BABU GN, UNPUB MACROMOLECULES
[3]  
BURLANT W, 1962, J POLYM SCI A2, V58, P491, DOI 10.1002/pol.1962.1205816627
[4]  
Charlesby A., 1960, ATOMIC RAD POLYM
[5]   CONTRAST IN THE ELECTRON-BEAM LITHOGRAPHY OF SUBSTITUTED AROMATIC HOMOPOLYMERS AND CO-POLYMERS [J].
FEIT, ED ;
THOMPSON, LF ;
WILKINS, CW ;
WURTZ, ME ;
DOERRIES, EM ;
STILLWAGON, LE .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06) :1997-2002
[6]  
FEIT ED, 1980, POLYM SCI ENG, V17, P420
[7]   HIGH-PERFORMANCE ELECTRON NEGATIVE RESIST, CHLOROMETHYLATED POLYSTYRENE - A STUDY ON MOLECULAR-PARAMETERS [J].
IMAMURA, S ;
TAMAMURA, T ;
HARADA, K ;
SUGAWARA, S .
JOURNAL OF APPLIED POLYMER SCIENCE, 1982, 27 (03) :937-949
[8]  
JONTE M, 1982, THESIS U MASSACHUSET
[9]   RADIATIVE DEGRADATION OF SYNTHETIC POLYMERS: CHEMICAL PHYSICAL, ENVIRONMENTAL, AND TECHNOLOGICAL CONSIDERATIONS. [J].
Shalaby, S.W. .
Journal of Polymer Science, Macromolecular Reviews, 1979, 14 :419-458
[10]   IODINATED POLYSTYRENE - AN ION-MILLABLE NEGATIVE RESIST [J].
SHIRAISHI, H ;
TANIGUCHI, Y ;
HORIGOME, S ;
NONOGAKI, S .
POLYMER ENGINEERING AND SCIENCE, 1980, 20 (16) :1054-1057