100 KV ELECTRON-BEAM LITHOGRAPHY USING A SCHOTTKY FIELD-EMISSION SOURCE

被引：10

作者：

KOEK, BH ^{[1
]}

CHISHOLM, T ^{[1
]}

SOMERS, J ^{[1
]}

DAVEY, J ^{[1
]}

ROMIJN, J ^{[1
]}

VONRUN, AJ ^{[1
]}

机构：

[1] DELFT UNIV TECHNOL,DELFT INST MICROELECTR & SUBMICRON TECHNOL,2600 GA DELFT,NETHERLANDS

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1994年 / 12卷 / 06期

关键词：

D O I：

10.1116/1.587522

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：3409 / 3412

页数：4

共 9 条

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[7] LOW-VOLTAGE, HIGH-RESOLUTION STUDIES OF ELECTRON-BEAM RESIST EXPOSURE AND PROXIMITY EFFECT [J].

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[8] LOW-VOLTAGE ELECTRON-BEAM LITHOGRAPHY [J].

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