A SCHOTTKY-EMITTER ELECTRON SOURCE FOR WIDE-RANGE LITHOGRAPHY APPLICATIONS

被引：11

作者：

KOEK, BH ^{[1
]}

CHISHOLM, T ^{[1
]}

DAVEY, JP ^{[1
]}

ROMIJN, J ^{[1
]}

VONRUN, AJ ^{[1
]}

机构：

[1] DELFT UNIV TECHNOL, DELFT INST MICROELECTR & SUBMICRON TECHNOL, 2600 GA DELFT, NETHERLANDS

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1993年 / 32卷 / 12B期

关键词：

ELECTRON-BEAM; ELECTRON-OPTICS; LITHOGRAPHY; NANOSTRUCTURE; RETICLE; SCHOTTKY EMISSION; TFE;

D O I：

10.1143/JJAP.32.5982

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A new 3-lens electron optical column using a Schottky emitter has been designed to perform very high-resolution lithography and also to produce reticles with good throughput. The theoretical performance has been computed from the source and lens characteristics and stochastic beam broadening. Measurements have shown excellent stability off the beam position and current. The measured current in a given spot-size is not as great as the theory predicts and further investigation is required. Examples are given of nanostructures formed by gold lift-off and of a DRAM reticle. The column is in use by research workers in the Technical University of Delft and examples of masks for Josephson junctions are shown.

引用

页码：5982 / 5987

页数：6

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