DIFFUSION OF ARSENIC IN BILAYER POLYCRYSTALLINE SILICON FILMS

[1] ARIENZO M, 1983, EL SOC EXT ABST, V83, P605

[2] BARSON F, 1982, EL SOC EXT ABS, V82, P265

[3] DETERMINATION OF THE HYDROGEN DIFFUSION-COEFFICIENT IN HYDROGENATED AMORPHOUS-SILICON FROM HYDROGEN EFFUSION EXPERIMENTS [J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (12) : 8745 - 8750

[4] DIFFUSION MODEL FOR ARSENIC IN SILICON [J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1971, 15 (06) : 472 - &

[5] DVURECHENSKII AV, 1982, SOV PHYS SEMICOND+, V16, P400

[6] Gjostein N. A., 1973, DIFFUSION, P241

[7] SEGREGATION OF SOLUTE ATOMS AT DISLOCATIONS IN LOW-ANGLE GRAIN-BOUNDARIES [J]. SCRIPTA METALLURGICA, 1983, 17 (03): : 405 - 410

[8] INFLUENCE OF DISLOCATIONS ON DIFFUSION KINETICS IN SOLIDS WITH PARTICULAR REFERENCE TO ALKALI HALIDES [J]. TRANSACTIONS OF THE FARADAY SOCIETY, 1961, 57 (08): : 1191 - &

[9] GRAIN-BOUNDARY DIFFUSION OF ALUMINUM IN POLYCRYSTALLINE SILICON FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (03) : 1576 - 1581

[10] KERN W, 1970, RCA REV, V31, P187

[1] ARIENZO M, 1983, EL SOC EXT ABST, V83, P605

[2] BARSON F, 1982, EL SOC EXT ABS, V82, P265

[3] DETERMINATION OF THE HYDROGEN DIFFUSION-COEFFICIENT IN HYDROGENATED AMORPHOUS-SILICON FROM HYDROGEN EFFUSION EXPERIMENTS [J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (12) : 8745 - 8750

[4] DIFFUSION MODEL FOR ARSENIC IN SILICON [J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1971, 15 (06) : 472 - &

[5] DVURECHENSKII AV, 1982, SOV PHYS SEMICOND+, V16, P400

[6] Gjostein N. A., 1973, DIFFUSION, P241

[7] SEGREGATION OF SOLUTE ATOMS AT DISLOCATIONS IN LOW-ANGLE GRAIN-BOUNDARIES [J]. SCRIPTA METALLURGICA, 1983, 17 (03): : 405 - 410

[8] INFLUENCE OF DISLOCATIONS ON DIFFUSION KINETICS IN SOLIDS WITH PARTICULAR REFERENCE TO ALKALI HALIDES [J]. TRANSACTIONS OF THE FARADAY SOCIETY, 1961, 57 (08): : 1191 - &

[9] GRAIN-BOUNDARY DIFFUSION OF ALUMINUM IN POLYCRYSTALLINE SILICON FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (03) : 1576 - 1581

[10] KERN W, 1970, RCA REV, V31, P187