STRUCTURE AND LOCATION OF MISFIT DISLOCATIONS IN INGAAS EPILAYERS GROWN ON VICINAL GAAS(001) SUBSTRATES

被引:18
作者
CHEN, Y
ZAKHAROV, ND
WERNER, P
LILIENTALWEBER, Z
WASHBURN, J
KLEM, JF
TSAO, JY
机构
[1] LAWRENCE BERKELEY LAB,BERKELEY,CA 94720
[2] SANDIA NATL LABS,ALBUQUERQUE,NM 87185
关键词
D O I
10.1063/1.108632
中图分类号
O59 [应用物理学];
学科分类号
摘要
The atomic structure of misfit dislocations at In0.2Ga0.8As/GaAs interfaces misoriented 2-degrees-10-degrees from (001) has been investigated by high-resolution electron microscopy. The misfit dislocations are predominantly dissociated 60-degrees dislocations consisting of 90-degrees and 30-degrees Shockley partial dislocations and enclosed stacking faults. These dissociated 60-degrees dislocations form increasingly asymmetrically on the different {111} glide planes as the misorientation increases. The 90-degrees partial dislocations are not confined to the interface, but lie 0-100 angstrom beneath it. The 30-degrees partial dislocations, in turn, are pushed even further into the substrate.
引用
收藏
页码:1536 / 1538
页数:3
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