HIGH-FIELD DRIFT VELOCITY OF ELECTRONS AT THE SI-SIO2 INTERFACE AS DETERMINED BY A TIME-OF-FLIGHT TECHNIQUE

被引：102

作者：

COOPER, JA

NELSON, DF

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1983年 / 54卷 / 03期

关键词：

D O I：

10.1063/1.332170

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1445 / 1456

页数：12

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