LOW-TEMPERATURE DIFFUSION STUDY OF XE IMPLANTED INTO A PHOTORESIST FILM

被引：10

作者：

BEHAR, M

AMARAL, L

KASCHNY, JR

ZAWISLAK, FC

机构：

[1] Instituto de Fisica, UFRGS, 91500 Porto Alegre, RS

来源：

PHYSICS LETTERS A | 1990年 / 148卷 / 1-2期

关键词：

D O I：

10.1016/0375-9601(90)90585-C

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

We report on low temperature diffusion results of Xe implanted at 90 K into a AZ1350 photoresist. The as implanted Xe spectrum shows a regular profile with range parameters well reproduced by the theory. Successive annealings performed in the temperature range 90-293 K reveal the existence of two diffusional processes. A slow one which occurs in the near surface region and a rapid one (in the deeper zone) which is responsible for the apperance of a penetrating tail directed toward the bulk. © 1990.

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页码：104 / 106

页数：3

相关论文

共 10 条

[1]

BEHAR M, IN PRESS NUCL INSTRU

[2]

BEHAR M, IN PRESS PHYS REV B

[3] A MONTE-CARLO COMPUTER-PROGRAM FOR THE TRANSPORT OF ENERGETIC IONS IN AMORPHOUS TARGETS [J].

BIERSACK, JP ;

HAGGMARK, LG .

NUCLEAR INSTRUMENTS & METHODS, 1980, 174 (1-2) :257-269

[4] MOLECULAR PROPERTIES OF AMORPHOUS HIGH POLYMERS .1. A CELL THEORY FOR AMORPHOUS HIGH POLYMERS [J].

DIBENEDETTO, AT .

JOURNAL OF POLYMER SCIENCE PART A-GENERAL PAPERS, 1963, 1 (11) :3459-&

[5] MASS AND ENERGY-DEPENDENCE OF IMPLANTED ION PROFILES IN THE AZ111 PHOTORESIST [J].

GUIMARAES, RB ;

BEHAR, M ;

LIVI, RP ;

DESOUZA, JP ;

ZAWISLAK, FC ;

FINK, D ;

BIERSACK, JP .

JOURNAL OF APPLIED PHYSICS, 1986, 60 (04) :1322-1324

[6] IMPLANTED BORON DEPTH PROFILES IN THE AZ111 PHOTORESIST [J].

GUIMARAES, RB ;

AMARAL, L ;

BEHAR, M ;

FICHTNER, PFP ;

ZAWISLAK, FC ;

FINK, D .

JOURNAL OF APPLIED PHYSICS, 1988, 63 (06) :2083-2085

[7] ANOMALOUS DEPTH PROFILES OF LIGHT-IONS AND NOBLE-GASES IMPLANTED INTO POLYMERS [J].

GUIMARAES, RB ;

AMARAL, L ;

BEHAR, M ;

ZAWISLAK, FC ;

FINK, D .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1989, 39 (1-4) :800-804

[8] DOSE AND ENERGY-DEPENDENCE OF IMPLANTED ION PROFILES (9 LESS-THAN-OR-EQUAL-TO Z1 LESS-THAN-OR-EQUAL-TO 83) IN THE AZ111 PHOTORESIST [J].

GUIMARAES, RB ;

BEHAR, M ;

LIVI, RP ;

DESOUZA, JP ;

AMARAL, L ;

ZAWISLAK, FC ;

FINK, D ;

BIERSACK, JP .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1987, 19-20 :882-886

[9] THE DIFFUSION OF GASES THROUGH POLYVINYL ACETATE [J].

MEARES, P .

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1954, 76 (13) :3415-3422

[10]

Ziegler J.F., 1985, STOPPING RANGE IONS