RHEED-BASED MEASUREMENTS OF ATOMIC SEGREGATION AT GAAS/ALAS INTERFACES

被引:12
作者
ETIENNE, B
LARUELLE, F
机构
[1] Laboratoire de Microstructures et de Microélectronique (L2M), CNRS, F-92225 Bagneux Cedex
关键词
D O I
10.1016/0022-0248(93)90790-4
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
We have developed a simple method, based on the observation of transitions between surface reconstructions, allowing a direct in-situ measurement of Ga/Al atomic exchange, an effect known to occur when AlAs is grown on top of GaAs. We use it to demonstrate that this segregation, which results in interface broadening and weak lateral modulation in 2D or 1D quantum structures, depends strongly, at a fixed substrate temperature, on the choice of the growth conditions.
引用
收藏
页码:1056 / 1058
页数:3
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