OXIDATION OF ARSENIC IMPLANTED POLYCRYSTALLINE SILICON

被引：4

作者：

KINSBRON, E

MURARKA, SP

SHENG, TT

LYNCH, WT

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1983年 / 130卷 / 07期

关键词：

D O I：

10.1149/1.2120033

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：1555 / 1560

页数：6

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