THERMAL-OXIDATION OF ARSENIC-DIFFUSED SILICON

被引：11

作者：

OHKAWA, S

NAKAJIMA, Y

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1978年 / 125卷 / 12期

关键词：

D O I：

10.1149/1.2131350

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：1997 / 2002

页数：6

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共 11 条

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[7] SIMPLIFIED EXPRESSION FOR DISTRIBUTION OF DIFFUSED IMPURITY
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[8] Nakajima Y., 1972, Fujitsu Scientific and Technical Journal, V8, P93
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