ARSENIC ISOCONCENTRATION DIFFUSION STUDIES IN SILICON

被引:95
作者
MASTERS, BJ
FAIRFIEL.JM
机构
[1] IBM Components Division, East Fishkill Facility, Hopewell Junction
关键词
D O I
10.1063/1.1658001
中图分类号
O59 [应用物理学];
学科分类号
摘要
Arsenic radiotracer diffusions have been performed both in intrinsic and in homogeneously doped extrinsic silicon single crystals. Under intrinsic conditions, the tracer diffusion coefficient may be represented by the expression Di=60 exp (-4.20 eV/kT) cm2/sec. Measured in extrinsic silicon, in the absence of a concentration gradient, the tracer diffusion coefficient conforms with the relationship D=Di(n/n i), in which (n/ni) in the ratio of the free electron concentration in the extrinsic sample to that of intrinsic silicon at the diffusion temperature. © 1969 The American Institute of Physics.
引用
收藏
页码:2390 / &
相关论文
共 22 条
[1]  
ARMSTRONG WJ, 1962, J ELECTROCHEM SOC, V104, P1065
[2]   SELF-DIFFUSION IN INTRINSIC AND EXTRINSIC SILICON [J].
FAIRFIEL.JM ;
MASTERS, BJ .
JOURNAL OF APPLIED PHYSICS, 1967, 38 (08) :3148-&
[3]  
Fick A., 1855, ANN PHYS, V170, P59, DOI [DOI 10.1002/ANDP.18551700105, 10.1002/andp.18551700105]
[4]   EFFECT OF IMPURITIES ON ANNEALING BEHAVIOR OF IRRADIATED SILICON [J].
HIRATA, M ;
HIRATA, M ;
SAITO, H ;
CRAWFORD, JH .
JOURNAL OF APPLIED PHYSICS, 1967, 38 (06) :2433-&
[5]   INTERACTIONS IN SEQUENTIAL DIFFUSION PROCESSES IN SEMICONDUCTORS [J].
HU, SM ;
SCHMIDT, S .
JOURNAL OF APPLIED PHYSICS, 1968, 39 (09) :4272-+
[6]   DIFFUSANT IMPURITY-CONCENTRATION PROFILES IN THIN LAYERS ON SILICON [J].
ILES, PA ;
LEIBENHAUT, B .
SOLID-STATE ELECTRONICS, 1962, 5 (SEP-O) :331-&
[7]   DIFFUSION-INDUCED IMPERFECTIONS IN SILICON [J].
JOSHI, ML ;
WILHELM, F .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (2P1) :185-&
[8]   DIFFUSION OF BORON INTO SILICON [J].
KURTZ, AD ;
YEE, R .
JOURNAL OF APPLIED PHYSICS, 1960, 31 (02) :303-305
[9]   IONIZATION INTERACTION BETWEEN IMPURITIES IN SEMICONDUCTORS AND INSULATORS [J].
LONGINI, RL ;
GREENE, RF .
PHYSICAL REVIEW, 1956, 102 (04) :992-999
[10]   THE DIFFUSION OF PHOSPHORUS IN SILICON [J].
MACKINTOSH, IM .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1962, 109 (05) :392-401