SILICON-NITRIDE THIN-FILMS BY LOW-VOLTAGE REACTIVE ION PLATING - OPTICAL-PROPERTIES AND COMPOSITION

被引：14

作者：

BOVARD, BG ^{[1
]}

RAMM, J ^{[1
]}

HORA, R ^{[1
]}

HANSELMANN, F ^{[1
]}

机构：

[1] BALZERS AG, FL-9496 BALZERS, LIECHTENSTEIN

来源：

APPLIED OPTICS | 1989年 / 28卷 / 20期

关键词：

D O I：

10.1364/AO.28.004436

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：4436 / 4441

页数：6

共 26 条

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[2]

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[4]

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[5]

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[8] STRUCTURE-RELATED OPTICAL-PROPERTIES OF THIN-FILMS [J].

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[9]

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[10] SIMPLE METHOD FOR DETERMINATION OF OPTICAL-CONSTANTS N,K AND THICKNESS OF A WEAKLY ABSORBING THIN-FILM [J].

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