COMPARATIVE-EVALUATION OF CHEMICALLY AMPLIFIED RESISTS FOR ELECTRON-BEAM TOP SURFACE IMAGING USE

被引：5

作者：

IRMSCHER, M

HOFFLINGER, B

SPRINGER, R

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1994年 / 12卷 / 06期

关键词：

D O I：

10.1116/1.587576

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：3925 / 3929

页数：5

共 12 条

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[9] SILYLATED ACID HARDENED RESIST PROCESS - A DEEP ULTRAVIOLET SURFACE IMAGING TECHNIQUE [J].

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