ION MIXING

被引：105

作者：

MATTESON, S ^{[1
]}

NICOLET, MA ^{[1
]}

机构：

[1] CALTECH,PASADENA,CA 91125

来源：

ANNUAL REVIEW OF MATERIALS SCIENCE | 1983年 / 13卷

关键词：

D O I：

10.1146/annurev.ms.13.080183.002011

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：339 / 362

页数：24

共 81 条

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ANDERSEN, HH
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MOYLE, J
SCHALIT, M
[J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (03) : 1342 - 1349
[4] BAGLIN J, 1980, THIN FILM INTERFACES
[5] Baron M., 1982, Metastable Materials Formation by Ion Implantation. Proceedings of the Materials Research Society Annual Meeting, P43
[6] BESENBACHER F, 1982, 1982 P ION BEAM MOD
[7] BHIDE VG, 1982, 1982 P ION BEAM MOD
[8] BIASSE B, 1982, 1982 P ION BEAM MOD
[9] CAMPISANO SU, 1982, 1982 P ION BEAM MOD
[10] SILICIDE FORMATION BY HIGH-DOSE SI+-ION IMPLANTATION OF PD
CHAPMAN, GE
LAU, SS
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MAYER, JW
[J]. JOURNAL OF APPLIED PHYSICS, 1979, 50 (10) : 6321 - 6327