CLOSE SPATIAL CORRELATION AND CHEMICAL EFFECTS IN ANNEALING OF PARAMAGNETIC OXYGEN VACANCIES (E1' CENTERS) IN ION-IMPLANTED AMORPHOUS SIO2

被引:5
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GOLANSKI, A
PFISTER, JC
NICOLLE, T
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10.1063/1.336546
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O59 [应用物理学];
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页码:1096 / 1102
页数:7
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共 58 条
[51]   INTRODUCTION OF CHARGE IN SIO2 AND INCREASE OF INTERFACE STATES DURING BREAKDOWN OF EMITTER-BASE JUNCTION OF GATED TRANSISTORS [J].
VERWEY, JF .
APPLIED PHYSICS LETTERS, 1969, 15 (08) :270-+
[52]   THEORETICAL TREATMENT OF THE KINETICS OF DIFFUSION-LIMITED REACTIONS [J].
WAITE, TR .
PHYSICAL REVIEW, 1957, 107 (02) :463-470
[53]   COMPUTER-SIMULATION OF ION-BOMBARDMENT COLLISION CASCADES [J].
WALKER, RS ;
THOMPSON, DA .
RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1978, 37 (1-2) :113-120
[54]   CHANGES IN CHEMICAL STABILITY OF ION-IMPLANTED SILICA GLASS [J].
WEBB, AP ;
HOUGHTON, AJ ;
TOWNSEND, PD .
RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1976, 30 (03) :177-182
[55]   IRRADIATION EFFECTS AND SHORT-RANGE ORDER IN FUSED SILICA AND QUARTZ [J].
WEEKS, RA ;
NELSON, CM .
JOURNAL OF APPLIED PHYSICS, 1960, 31 (09) :1555-1558
[56]  
WINTERBON BK, 1975, ION IMPLANTATION RAN
[57]   ELECTRONIC-STRUCTURE OF E1' CENTERS IN SIO2 [J].
YIP, KL ;
BEALLFOWLER, W .
PHYSICAL REVIEW B, 1975, 11 (06) :2327-2338
[58]  
ZAININGER KH, 1966, IEEE T NUCL SCI, VNS13, P237