ELECTROMECHANICAL PROPERTIES OF THIN VO2 FILMS ON POLYIMIDE SUBSTRATES

被引：11

作者：

HAKIM, MO ^{[1
]}

BABULANAM, SM ^{[1
]}

GRANQVIST, CG ^{[1
]}

机构：

[1] CHALMERS UNIV TECHNOL,DEPT PHYS,S-41296 GOTHENBURG,SWEDEN

来源：

THIN SOLID FILMS | 1988年 / 158卷 / 02期

关键词：

ELECTRIC CONDUCTIVITY - POLYIMIDES - SEMICONDUCTOR MATERIALS - STRAIN GAGES - SUBSTRATES;

D O I：

10.1016/0040-6090(88)90037-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

VO//2 films have been produced on polyimide substrates by reactive electron beam evaporation followed by annealing post-treatment. Films with thicknesses of about 0. 5 mu m had a gauge factor about 100 times larger than that for conventional strain gauges. The temperature dependence of the resistivity may be explained in terms of a strain-sensitive semiconductor-metal transition in somewhat inhomogeneous VO//2. However, this model accounts neither for the film thickness dependence of the gauge factor nor for the fact that polyimide is superior to glass as a substrate material. It is conceivable that a partially pyrolyzed surface layer plays some role in polyimide foils.

引用

页码：L49 / L52

页数：4

共 16 条

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[16] [No title captured]

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