FAST PHOTOELECTROCHEMICAL ETCHING OF QUARTER-MICROMETER DIFFRACTION GRATINGS IN N-INP

被引：10

作者：

MATZ, R

ZIRRGIEBEL, J

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1988年 / 64卷 / 07期

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D O I：

10.1063/1.341495

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：3402 / 3406

页数：5

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