MASKLESS FABRICATION OF HIGH-QUALITY DFB LASER GRATINGS BY LASER-INDUCED CHEMICAL ETCHING

被引：7

作者：

AOYAGI, Y ^{[1
]}

MASUDA, S ^{[1
]}

DOI, A ^{[1
]}

NAMBA, S ^{[1
]}

机构：

[1] INT MICRO TECHNOL CORP,CHIYODA KU,TOKYO 101,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1985年 / 24卷 / 05期

关键词：

ETCHING - Laser Applications - SEMICONDUCTING GALLIUM ARSENIDE - SEMICONDUCTING INDIUM COMPOUNDS;

D O I：

10.1143/JJAP.24.L294

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

High quality submicron DFB laser gratings with 130 nm groove depth are fabricated without roughness on a grating surface by laser induced chemical etching. It is found that rigid configuration of an irradiation cell and directional etching performance of laser etching is very important to obtain high quality gratings.

引用

页码：L294 / L296

页数：3

共 8 条

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