SPUTTERING OF METALS IN PRESENCE OF REACTIVE GASES

被引:39
作者
HRBEK, J [1 ]
机构
[1] CZECHOSLOVAK ACAD SCI, J HEYROVSKY INST PHYS CHEM & ELECTROCHEM, CS-12138 PRAHA 2, CZECHOSLOVAKIA
关键词
D O I
10.1016/0040-6090(77)90416-3
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:185 / 191
页数:7
相关论文
共 25 条
[1]   DEPOSITION RATE OF METALLIC THIN-FILMS IN REACTIVE SPUTTERING PROCESS [J].
ABE, T ;
YAMASHINA, T .
THIN SOLID FILMS, 1975, 30 (01) :19-27
[2]  
[Anonymous], 1953, VACUUM, DOI DOI 10.1016/0042-207X(53)90411-4
[3]   SURFACE INVESTIGATION OF SOLIDS BY STATICAL METHOD OF SECONDARY ION MASS SPECTROSCOPY (SIMS) [J].
BENNINGHOVEN, A .
SURFACE SCIENCE, 1973, 35 (01) :427-457
[4]  
Bernheim M., 1973, International Journal of Mass Spectrometry and Ion Physics, V12, P93, DOI 10.1016/0020-7381(73)80090-7
[5]   ADSORPTION OF GASES STUDIED BY SECONDARY ION EMISSION MASS-SPECTROMETRY [J].
BLAISE, G ;
BERNHEIM, M .
SURFACE SCIENCE, 1975, 47 (01) :324-343
[6]  
CANTAGREL M, 1973, J MATER SCI, V8, P1711, DOI 10.1007/BF02403521
[7]  
CORBEK CJ, 1933, J OPT SOC AM, V23, P109
[8]   FORMATION OF CONES DURING SPUTTERING [J].
GVOSDOVER, RS ;
EFREMENKOVA, VM ;
SHELYAKIN, LB ;
YURASOVA, VE .
RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1976, 27 (3-4) :237-244
[9]  
Hayward DO., 1964, CHEMISORPTION
[10]   REACTIVE SPUTTERING OF METALS IN OXIDIZING ATMOSPHERES [J].
HELLER, J .
THIN SOLID FILMS, 1973, 7 (02) :163-176