STUDY OF ANGULAR FACTORS IN SPUTTER-DEPOSITION USING THE ION-BEAM METHOD

被引:16
作者
MOTOHIRO, T [1 ]
TAGA, Y [1 ]
NAKAJIMA, K [1 ]
机构
[1] TOYOTA TECHNOL INST,TEMPAKU KU,NAGOYA,JAPAN
关键词
D O I
10.1016/0039-6028(82)90014-0
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
引用
收藏
页码:66 / 74
页数:9
相关论文
共 14 条
[1]   TEMPERATURE COEFFICIENTS OF RESISTANCE OF METALLIC FILMS IN THE TEMPERATURE RANGE 25-DEGREES-C TO 600-DEGREES-C [J].
BELSER, RB ;
HICKLIN, WH .
JOURNAL OF APPLIED PHYSICS, 1959, 30 (03) :313-322
[2]   ENERGIES OF CU-1(+) IONS SPUTTERED FROM CU BY VERY LOW-ENERGY (50EV LESS-THAN E LESS-THAN 1 KEV) INERT-GAS IONS [J].
HART, RG ;
COOPER, CB .
SURFACE SCIENCE, 1980, 94 (01) :105-118
[3]   INTERFACE FORMATION DURING THIN FILM DEPOSITION [J].
MATTOX, DM ;
MCDONALD, JE .
JOURNAL OF APPLIED PHYSICS, 1963, 34 (08) :2493-&
[4]   QUANTITATIVE ELECTRON-PROBE MICROANALYSIS OF THIN-FILMS [J].
ODA, Y ;
NAKAJIMA, K .
TRANSACTIONS OF THE JAPAN INSTITUTE OF METALS, 1975, 16 (11) :697-701
[5]  
ODA Y, 1970, DIAGRAMS TABLES QUAN
[6]   COMPOSITION VARIATIONS AS A FUNCTION OF EJECTION ANGLE IN SPUTTERING OF ALLOYS [J].
OLSON, RR ;
WEHNER, GK .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01) :319-321
[7]   OBLIQUE-INCIDENCE ANISOTROPY IN EVAPORATED PERMALLOY FILMS [J].
SMITH, DO ;
COHEN, MS ;
WEISS, GP .
JOURNAL OF APPLIED PHYSICS, 1960, 31 (10) :1755-1762
[8]   SPUTTERING EXPERIMENTS WITH 1- TO 5-KEV AR+ IONS [J].
SOUTHERN, AL ;
ROBINSON, MT ;
WILLIS, WR .
JOURNAL OF APPLIED PHYSICS, 1963, 34 (01) :153-&
[9]   ENERGY DISTRIBUTION OF SPUTTERED CU ATOMS [J].
STUART, RV ;
WEHNER, GK .
JOURNAL OF APPLIED PHYSICS, 1964, 35 (06) :1819-&
[10]   ENERGY SPECTRUM OF EJECTED ATOMS DURING HIGH ENERGY SPUTTERING OF GOLD [J].
THOMPSON, MW .
PHILOSOPHICAL MAGAZINE, 1968, 18 (152) :377-&