STUDY OF ANGULAR FACTORS IN SPUTTER-DEPOSITION USING THE ION-BEAM METHOD

被引：16

作者：

MOTOHIRO, T ^{[1
]}

TAGA, Y ^{[1
]}

NAKAJIMA, K ^{[1
]}

机构：

[1] TOYOTA TECHNOL INST,TEMPAKU KU,NAGOYA,JAPAN

来源：

SURFACE SCIENCE | 1982年 / 118卷 / 1-2期

关键词：

D O I：

10.1016/0039-6028(82)90014-0

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：66 / 74

页数：9

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