PLASMA-ETCHED DEPTH MEASUREMENT OF FILMS USING THE DIFFRACTION OF A LAMELLAR GRATING

被引：5

作者：

MENDES, GF ^{[1
]}

CESCATO, L ^{[1
]}

FREJLICH, J ^{[1
]}

BRAGA, ES ^{[1
]}

MAMMANA, AP ^{[1
]}

机构：

[1] UNIV ESTADUAL CAMPINAS,FAC ENGN CAMPINAS,ELECTR & DISPOSIT LAB,BR-13100 CAMPINAS,SP,BRAZIL

来源：

关键词：

D O I：

10.1016/0040-6090(84)90083-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：107 / 116

页数：10

共 18 条

[1] Berning PH, 1963, PHYS THIN FILMS, V1, P69
[2] BORN M, 1975, PRINCIPLES OPTICS, P61
[3] BOSENBERG WA, 1983, SOLID STATE TECHNOL, V26, P79
[4] OPTICAL MONITORING OF THE ENDPOINT IN THIN-FILM PLASMA-ETCHING
BRAGA, ES
MENDES, GF
FREJLICH, J
MAMMANA, AP
[J]. THIN SOLID FILMS, 1983, 109 (04) : 363 - 369
[5] OPTICAL MONITORING OF ETCHING IN INORGANIC RESISTS
CHANG, MS
HOU, TW
[J]. THIN SOLID FILMS, 1978, 55 (03) : 463 - 471
[6] CURTIS BJ, 1980, SOLID STATE TECHNOL, V23, P129
[7] FOK TY, 1980, 1980 EL SOC M ST LOU, V80, P301
[8] GAERTNER, ELLIPSOMETRIC TABLES
[9] ENDPOINT DETECTION IN PLASMA-ETCHING BY OPTICAL-EMISSION SPECTROSCOPY
HIROBE, K
TSUCHIMOTO, T
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (01) : 234 - 235
[10] KLEINKNECHT HP, 1978, J ELECTROCHEM SOC, V125, P798, DOI 10.1149/1.2131551