DEPOSITION OF ALOXFY FILMS USING DC REACTIVE SPUTTERING

被引：5

作者：

BELKIND, A

KOPP, B

SHERMAN, R

机构：

[1] The BOC Group Technical Center, Murray Hill

来源：

THIN SOLID FILMS | 1991年 / 199卷 / 02期

关键词：

D O I：

10.1016/0040-6090(91)90010-U

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The deposition of low refractive index AlO(x)F(y) films by d.c. reactive sputtering in an Ar + O2 + CF4 atmosphere was analyzed. The composition and refractive index of the films depended on the deposition parameters: gas composition and cathode current. The deposition mechanism of AlO(x)F(y) and control of its composition are discussed. The refractive indices of AlOF2 and AlF3 were determined.

引用

页码：279 / 290

页数：12

共 29 条

[1] OPTICAL-PROPERTIES OF THIN-FILMS [J].